فتوالستیسیته (کشسان نگاری) جامع برای اندازه گیری تنش باقی مانده غیر مخرب در شیشه

Integrated photoelasticity for nondestructive residual stress measurement in glass H. Aben*, L. Ainola, J. Anton Laboratory of Photoelasticity, Institute of Cybernetics, Tallinn Technical University, Akadeemia tee 21, 12618 Tallinn, Estonia Received 30 November 1999; accepted 4 February 2000 Abstract The paper gives a review of integrated photoelasticity and of its application for residual stress measurement in glass. By considering the basic theory of the method, two particular cases, the cas ...

فتوالستیسیته (کشسان نگاری) جامع برای اندازه گیری تنش باقی مانده غیر مخرب در شیشه

  Integrated photoelasticity for nondestructive residual stress measurement in glass   H. Aben*, L. Ainola, J. Anton Laboratory of Photoelasticity, Institute of Cybernetics, Tallinn Technical University, Akadeemia tee 21, 12618 Tallinn, Estonia Received 30 November 1999; accepted 4 February 2000   Abstract The paper gives a review of integrated photoelasticity and of its application for residual stress measurement in glass. By considering the basic theory of the method, two part ...